• Eliminating Cross Contamination and Sample Loss During Solvent Removal

Chromatography

Eliminating Cross Contamination and Sample Loss During Solvent Removal

Jun 20 2007

Dri-Pure® is a unique technology developed by Genevac that enables rapid sample drying with no loss of sample and no cross-contamination due to solvent bumping. The patented Dri-Pure® technology is available for all current models of Genevac centrifugal evaporators, from the affordable EZ-2 and HT-4X bench-top units to the production-scale Mega 1200.

Two independent studies are available demonstrating the utility of Dri-Pure technology. A recent study by Evotec-OAI demonstrates the benefits of Dri-Pure® in eliminating solvent bumping from larger sample volumes found in tubes and vials. A further study by GlaxoWellcome UK describes the benefits of Dri-Pure in evaporating solvents from microplates during LC/MS purification.

Dri-Pure® offers significant benefits to scientists, especially those working in synthesis and purification. Where other methods of solvent removal are either very laborious or lead to unacceptable cross-contamination, Dri-Pure® running on a Genevac evaporator gives smooth, controlled solvent removal in optimum time. It represents a significant benefit for chemists working in parallel synthesis, drug discovery and compound purification.
Genevac's unique anti-bumping system works by carefully controlling the reducing pressure in the evaporation chamber in combination with an increase in rotor speed to achieve greater g-force. In addition, heat flow to the samples must be reduced by switching off the infrared heat lamps during the pressure ramping stage. Dri-Pure® achieves all this in embedded instrument software that makes such an elegant solution very easy to apply.

Digital Edition

Lab Asia 31.1 - February 2024

February 2024

In This Edition Chromatography Articles - Comparing techniques for flow rate measurement in Liquid Chromatography Mass Spectrometry & Spectroscopy Articles - APGC: A Better Future with...

View all digital editions

Events

SIAF Guangzhou

Mar 04 2024 Guanghzou, China

China Lab 2024

Mar 05 2024 Guangzhou, China

Laborama 2024

Mar 14 2024 Brussels, Belgium

MSACL 2024

Mar 17 2024 Monterey, CA, USA

ACS National Meeting & Expo, Spring 2024

Mar 17 2024 New Orleans, LA, USA

View all events