High-Resolution ICP-OES Spectrometer for Elemental Analysis Surpasses Performance Limitations

The new SPECTRO ARCOS high-resolution ICP-OES spectrometer is the first and only spectrometer featuring the fast, convenient selection of axial plasma or radial plasma observation in a single instrument - without any optical compromise.

For elemental analysis applications in industry, science, and academia, the SPECTRO ARCOS surpasses the performance limitations of conventional ICP-OES instruments - dramatically improving sensitivity, stability, and precision, while lowering operating costs with the introduction of innovative components, unique capabilities, and optimum flexibility.

The SPECTRO ARCOS establishes a new ICP-OES performance class for complex analytical tasks - resolving a wide array of inherent problems in traditional spectrometer design, and caps 30 years of SPECTRO experience in developing advanced solution for the elemental analysis of metals, chemicals, petrochemicals and other materials.

Features of the SPECTRO ARCOS include: unique new MultiView capability delivers unmatched improvements in accuracy and stability and allows for the fast, convenient selection of axial plasma or radial plasma observation with no optical compromise; the CCD optic system with a Paschen-Runge mount assembly delivers a matchless resolution of 8.5 picometer in the wavelength range from 130 to 340 nm; unique new solid-state generator design provides the highest plasma power available for extreme or quickly changing plasma loads; UV-PLUS sealed optical chamber ends the need for the purging of argon or nitrogen gases; the air-cooled interface technology and air-cooled generator eliminates need for an external cooling system.

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