New High-Resolution ICP-OES Spectrometer for Elemental Analysis Surpasses Performance Limitations

The new SPECTRO ARCOS high-resolution ICP-OES spectrometer is the first and only spectrometer featuring the fast, convenient selection of axial plasma or radial plasma observation in a single instrument - without any optical compromise.

For elemental analysis applications in industry, science, and academia, the new SPECTRO ARCOS surpasses the performance limitations of conventional ICP-OES instruments - dramatically improving sensitivity, stability, and precision, while lowering operating costs.

The new SPECTRO ARCOS establishes a new ICP-OES performance class for complex analytical tasks - resolving a wide array of inherent problems in traditional spectrometer design.

Features include:

• Unique new MultiView capability delivers unmatched improvements in accuracy and stability and allows for the fast, convenient selection of axial plasma or radial plasma observation with no optical compromise.
• The CCD optic system with a Paschen-Runge mount assembly delivers a matchless resolution of 8.5 picometer in the wavelength range from 130 to 340 nm.
• Unique new solid-state generator design provides the highest plasma power available for extreme or quickly changing plasma loads.
• UV-PLUS sealed optical chamber ends the need for the purging of argon or nitrogen gases.
• The air-cooled interface technology and air-cooled generator eliminates need for an external cooling system.

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