Revolutionising surface engineering with HiPIMS technology

Hiden Analytical unveils the High-Power Impulse Magnetron Sputtering (HiPIMS) technique, a major leap forward in surface engineering. This innovative method, derived from conventional magnetron sputtering, improves the quality and durability of coated surfaces through powerful, short bursts of energy.

HiPIMS achieves peak power in the kW to MW range, generating a dense plasma that surpasses traditional sputtering methods. With a low-duty cycle (10-100 μs), this technology reduces heat output while maintaining efficiency, making it ideal for diverse applications.

A key feature of HiPIMS is its ability to deposit ultra-hard materials like titanium nitride (TiN), offering superior hardness and wear resistance for components such as fasteners, cutting tools, and gears. This leads to extended lifespan and enhanced performance in sensitive components.

To complement HiPIMS, Hiden Analytical's EQP mass and energy analyser offers comprehensive plasma analysis, allowing precise monitoring and fine-tuning of TiN coatings. This ensures that coatings produced with HiPIMS meet the highest standards of quality and durability.

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