Spectro Analytical Instruments introduced the next generation of XRF spectrometry instruments?the SPECTRO iQ II at the Pittcon Conference in Chicago.
Introduced in 2005, the SPECTRO iQ was specifically developed for demanding process control applications. It uses polarized excitation to perform multi-elemental analysis of solid, powder and liquid samples primarily for process control, where rapid analysis, reliable analytical results and simplified operation are especially important.
The latest version of the SPECTRO iQ surpasses its predecessor by being easier to operate and incorporating a new detection system derived from the larger and more powerful SPECTRO XEPOS XRF instrument.
Among the improvements is a new software control interface that allows the addition of an optional touch-screen computer. With the touch screen and the clearly structured menus, it is no problem for non-technical personnel to start, monitor, evaluate and document the analytical processes with only a few commands.
In addition to its innovative control software, the SPECTRO iQ II is equipped with a new Silicon Drift Detector unit that is technically derived from the detector in the larger and more powerful SPECTRO XEPOS XRF spectrometer.
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