• New Multibeam SEM/FIB for Simultaneous Micro Milling and High Resolution SEM Imaging

Microscopy & Microtechniques

New Multibeam SEM/FIB for Simultaneous Micro Milling and High Resolution SEM Imaging

Jan 30 2008

Jeol USA introduces a new high throughput SEM/FIB that combines Focused Ion Beam micro milling with the high resolution imaging of the Jeol LaB6 electron column. The MultiBeam is a high-productivity tool for IC defect analysis, circuit modification, TEM thin film sample preparation, and mask repair.

A versatile all-in-one system, the MultiBeam features Serial Slicing and Sampling (S3TM) for in-process monitoring of milling, fabrication, and reconstructing 3D images of the sectioned area. A maximum milling current of 30 nA ensures high throughput milling of large areas.

Additional features include low vacuum operation for non-conductive specimens without coating or alteration, a gas injection system for etching and deposition, a large stage for up to 150 mm samples, and a multiple port design for a range of analytical needs. Samples are loaded through a standard airlock system.

Two new nano-imaging labs will take delivery of the MultiBeam systems in early 2008. Jeol USA has formed a partnership with both the University of Southern California and Boston College which will advance applications research on the east and west coasts

Digital Edition

ILM 49.5 July

July 2024

Chromatography Articles - Understanding PFAS: Analysis and Implications Mass Spectrometry & Spectroscopy Articles - MS detection of Alzheimer’s blood-based biomarkers LIMS - Essent...

View all digital editions


ADLM 2024

Jul 28 2024 San Diego, CA USA

InaLab 2024

Jul 30 2024 Jakarta, Indonesia


Jul 31 2024 Chengdu, China

ACS National Meeting - Fall 2024

Aug 18 2024 Denver, CO, USA


Aug 25 2024 Copenhagen, Denmark

View all events