• Launch of the Eqp Ii Plasma Monitor for Plasma-related Process Characterisation

Laboratory Products

Launch of the Eqp Ii Plasma Monitor for Plasma-related Process Characterisation

May 14 2007

Hiden Analytical have introduced the Hiden EQP II Plasma Monitor for characterisation and optimisation of diverse plasma-related processes. The system directly measures mass and energy of both positive and negative process ions, measuring masses up to 2500amu and ion energies to 1000eV. The integral electron bombardment ion source provides for analysis of neutrals and, with the addition of the EAMS electron attachment mode, for separation and identification of electronegative radical species.

The fast pulse ion counting detector with continuous 7-decade dynamic range features new advanced data acquisition gating and timing functions enabling time-resolved studies for applications including pulsed plasma processes and modulated beam experiments, with sub-microsecond resolution and repetition rates to 20kHz. Acquired data is stored and integrated throughout a predetermined repetitive scan sequence for each individual acquisition time window.

The EQP II system is offered with single, double and triple stage pressure reduction options to accommodate the full process pressure range from 10-3mbar to atmosphere, with the single stage system operating to 1mbar. A multi-element drift lens precedes the energy filter and mass analyser with length options up to 750mm which, uniquely for large process chambers, enables direct analysis from deep within the process environment.

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