Launch of the Eqp Ii Plasma Monitor for Plasma-related Process Characterisation
May 14 2007
The fast pulse ion counting detector with continuous 7-decade dynamic range features new advanced data acquisition gating and timing functions enabling time-resolved studies for applications including pulsed plasma processes and modulated beam experiments, with sub-microsecond resolution and repetition rates to 20kHz. Acquired data is stored and integrated throughout a predetermined repetitive scan sequence for each individual acquisition time window.
The EQP II system is offered with single, double and triple stage pressure reduction options to accommodate the full process pressure range from 10-3mbar to atmosphere, with the single stage system operating to 1mbar. A multi-element drift lens precedes the energy filter and mass analyser with length options up to 750mm which, uniquely for large process chambers, enables direct analysis from deep within the process environment.
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