Leading Polish Institute installs advanced EB system

The Institute of Electronic Materials Technology (ITME) in Warsaw has purchased a high performance electron beam lithography system from Vistec Electron Beam GmbH to assist with research and manufacturing of micro-optical and diffractive elements, new materials and masks for optical lithography.

"We selected Vistec's electron-beam writer to support our research, development and manufacturing efforts due to its high performance and flexibility. We anticipate that the new Vistec SB251 will significantly contribute to successfully meet our research and development agenda.", said Dr. Zygmunt Luczynski, director of ITME. The decision was made as a result of a European tendering procedure.

The Vistec SB251 is a universal system, which offers both direct write as well as mask making exposures, enabling lithography below 50nm on various substrates from pieces up to 200mm wafers and 7inch masks. The system also features EQUIcon GmbH’s ePLACE data preparation software package.

"With the Vistec SB251 our long term partner ITME receives an advanced electron-beam lithography system. Due to its high flexibility and reliability the SB251 is perfectly tailored to the diversified applications ITME is facing now and will be challenged with in the future.", comments Wolfgang Dorl, General manager of Vistec Electron Beam. "We are very pleased that ITME placed the order with Vistec, which further continues our successful collaboration started more than 20 years ago."